Integrated model-based run-to-run uniformity control for epitaxial silicon deposition
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Model - Based Run - to - Run Uniformity Control for Epitaxial Silicon Deposition ]
This paper analyzes data taken by Gower-Hall for his MIT PhD thesis. In his thesis, Gower-Hall examines run-to-run control of epitaxial film deposition by way of thickness and resistivity measurements of the film deposited. Our main focus is analysis of the resistivity data captured from the experiments. We give an overview of the thesis, confirm Gower-Hall’s findings of the main factors influe...
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تاریخ انتشار 2001